Nanofabrication

The ANFF-Q has equipment and expertise in patterning of polymer and glass substrates, the production of novel substrates for immunotherapy and drug delivery, the fabrication of microfluidic devices and a globally unique SiC on Si Epitaxial reactor.

Services

Centre for Microscopy and Microanalysis (CMM) houses two state-of-the-art Electron Beam Lithography (EBL) systems in purposely built, class 10,000 cleanrooms at the Hawken Engineering building.

These instruments have been utilised for the fabrications of photonics, electronics, quantum devices and biosensors. CMM provides the full services for electron beam lithography and consultation for device fabrication.

Equipment

Environment: 100 m2 Class 10,000 cleanroom

Exposure systems

Raith EBPG 5150 EBL (Fully automatic exposure)

• 1.8 nm diameter Gaussian spot electron beam
• Beam current 10pA to 200nA
• 50 / 100 kV acceleration
• 125 MHz scan speed
• Up to 1 mm field size
• < 10 nm stitch accuracy
• 6”, 4”, 2” wafer / 5” photomask / small wafers

30 kV Raith eLINE Plus EBL

• 1.6 nm diameter Gaussian spot electron beam
• Beam current 5pA to 20nA
• 30 kV acceleration
• 20 MHz scan speed
• < 40 nm (mean+3σ)
• 4” wafer / small pieces
• In-situ deposition (W, Pt, Carbon, H2O, SiO2)
• In-situ etching (XeF2)
• Fix beam moving stage (FBMS)
• Move beam moving stage (MBMS)

Sample preparation equipment

• CEE Apogee Spincoater (8”)
• CEE Apogee Hotplate (8”)
• Diener Atto O2 Plasma cleaner (6”)
• Dektak XT stylus profiler
• Filmtek 2000M white light reflectometer
• Lattice gear Filpscribe
• Lattice gear LatticeAx 420

Contact