Nanofabrication

Centre for Microscopy and Microanalysis (CMM) houses two state-of-the-art Electron Beam Lithography (EBL) systems in purposely built, class 10,000 cleanrooms at the Hawken Engineering building. These instruments have been utilised for the fabrications of photonics, electronics, quantum devices and biosensors. CMM provides the full services for electron beam lithography and consultation for device fabrication.

Equipment

Environment: 100 m² Class 10,000 cleanroom

Exposure systems:

• Raith EBPG 5150 EBL (Fully automatic exposure)
  • 1.8 nm diameter Gaussian spot electron beam
  • Beam current 10pA to 200nA
  • 50 / 100 kV acceleration
  • 125 MHz scan speed
  • Up to 1 mm field size
  • < 10 nm stitch accuracy
  • 6”, 4”, 2” wafer / 5” photomask / small wafers

• 30 kV Raith eLINE Plus EBL
  • 1.6 nm diameter Gaussian spot electron beam
  • Beam current 5pA to 20nA
  • 30 kV acceleration
  • 20 MHz scan speed
  • < 40 nm (mean+3σ)
  • 4” wafer / small pieces
  • In-situ deposition (W, Pt, Carbon, H₂O, SiO₂)
  • In-situ etching (XeF2)
  • Fix beam moving stage (FBMS)
  • Move beam moving stage (MBMS)

Sample preparation equipment:

• CEE Apogee Spincoater (8”)
• CEE Apogee Hotplate (8”)
• Diener Atto O₂ Plasma cleaner (6”)
• Dektak XT stylus profiler
• Filmtek 2000M white light reflectometer
• Lattice gear Filpscribe
• Lattice gear LatticeAx 420

Contact 

Nanolithography Specialist Engineer

Dr Han-Hao (Elliot) Cheng

Centre for Microscopy and Microanalysis

(07) 3443 2682

h.cheng@uq.edu.au

Hawken Engineering Building #50, St Lucia